In silicon at T = 300 K the thermal-equilibrium concentration of electron is n0 = 5 x 10^4 cc. The hole concentration is
(a) 4.5 x 10^15 cc
(b) 4.5 x 10^15 m^3
(c) 0.3 x 10^-6 cc
(d) 0.3 x 10^-6 m^3
This question was posed to me during an interview.
This is a very interesting question from Semiconductor Physics topic in chapter EDC Overview of Electronic Devices & Circuits