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Which can be used as solutions which develop the photo resists in PCM?

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in Advanced Machining by (962k points)
Which can be used as solutions which develop the photo resists in PCM?

(a) Water

(b) Alkaline solution

(c) Hydrocarbons

(d) All of the mentioned

This question was posed to me in examination.

Query is from PCM-Process Description in chapter Chemical Processes of Advanced Machining

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Best answer
Right option is (d) All of the mentioned

For explanation: In PCM, the solutions mentioned above can be used to develop the photoresist films on the surfaces.

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