Question

Which of the following can be used for producing oxide films on their surfaces during anodic oxidation?

(a) La, Ce, Pr, Nd

(b) He, Ne, Ar, Kr

(c) Nh, Fl, Mc, Lv

(d) Al, Ta, Nb, Ti

The question was asked in semester exam.

My question comes from Preparation of Thin Films topic in portion Preparative Methods of Solid State Chemistry

Answer 1

The correct answer is (d) Al, Ta, Nb, Ti

To explain I would say: Anodic oxidation is an electrolyte method for producing oxide films on the surfaces of metals such as Al, Ta, Nb, Ti and Zr. These metals form the anode which is dipped in the electrolyte and oxide ions get deposited on their surfaces. He, Ne, Ar, Kr are inert gases they have full electronic configuration hence wont undergo anodic oxidation.